Labconco WaterPro PS/UF Polishing Stations, Labconco Waterpro PS/UF Polishing Station With Dispensing Gun is a reliable and dependable addition to the Labconco Laboratory Apparatus family of products. Combining top-notch and uncompromising quality with an affordable price, the Labconco WaterPro PS/UF Polishing Stations, Labconco Waterpro PS/UF Polishing Station With Dispensing Gun 9000703/ 26301-868 can fulfill your laboratory needs while still offering a great value for the money.
Product Category Description:
WaterPro* PS/UF Polishing Stations, Labconco*
For life science labs requiring Type I (up to 18.2 megohm-cm) water that is pyrogen-free. Pure polypropylene bowls accommodate an activated carbon cartridge and three deionization cartridges (not included). Includes an ultrafilter and has in-line dual (185nm and 254nm) UV reactor to reduce bacteria and organic chemicals. A UF flush valve allows a small portion of purified water to rinse the ultrafilter during automatic recirculation, maintaining its efficiency. Polishing station includes power switch, LED water purity level display, and timed control dispensing valve which delivers up to 1.1L per minute. Cabinet measures 79.1Wx19.6Dx21.9Hcm (311/8x73/4x85/8"). The overall height with bowls attached is 73.3cm (287/8"). Polishing station requires polishing kit 30181-416, which includes a carbon cartridge and three deionization cartridges.
Models 26301-857 and 26301-867 have a dispensing valve. Models 26301-866 and 26301-868 have the dispensing valve and a hand-held dispensing gun with 0.91m (3') recirculating line. Dispensing modules are incorporated within the polishing station — no separate module is required.
The 220V models are CE marked.
Ordering Information: Manufacturer's one-year warranty on parts and labor. Choose 115V with 2.4m (8') three-wire cord and plug, or 220V with 2.4m (8') three-wire cord (plug required). Optional hollow fiber final filter can be used on dispensing valve or gun to remove all particulates and bacteria larger than 0.2µm in diameter.